Layer termination from ellipsometric information is thoroughly built-in into Aeres®. Many different multi-wavelength and spectroscopic ellipsometry options are offered Together with the ion beam sputter deposition technique.
In-situ optical checking and Manage is accessible by Angstrom’s optical checking & Manage bundle.
An optional cryogenic pump improves foundation tension and pumping pace and may be isolated from the chamber for the duration of reactive processes with oxygen.
The scale, placement, and kit ratio of each and every Earth are optimized to deliver the absolute best attainable film thickness uniformity.
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Variable angle stages permit for very highly effective thin movie techniques. However, amongst its greatest problems is reproducibility. The substrate is often set at a very oblique angle in relation to the resource, plus the films are quite delicate Rare metals for aerospace on the precision of this angle.
Angstrom Engineering® patterns and engineers Every Reticle® platform to provide our associates inside the optics Neighborhood the opportunity to build the films they require with superb purity, density, and uniformity, all in a highly repeatable and automated vogue.
Our one of a kind layout allows for direct or oblique monitoring from the variable angle phase, doing away with the need for tooling variables or simply a witness glass changer. Learn more with regards to the Optical Checking & Handle deal right here.
In addition to sample rotation, the variable angle phase that's used for Reticle® delivers for in-built angular movement through the deposition flux.
All regular Reticle® platforms include things like an extra gridless finish-Hall ion resource with hollow cathode neutralizer.
The deposition ion source is directed toward a fabric goal which has been optimized in equally dimension and position for that necessary deposition geometry.
Self-aligned ion optics are configured especially for the desired deposition specifications and geometry of your respective process.
A lower-frequency neutralizer assures secure beam Procedure with out contamination from a standard filament.
Dynamic uniformity shaping is attained utilizing a flux correction shield amongst the deposition source and the substrate.
Considerate layout of your ion beam focusing optics confines the beam entirely to the realm from the focus on, eradicating any threat of contamination.